Влияние электронного облучения на кристаллическую структуру, микрорельеф поверхности и зондированную ширину тройных кристаллов допированного железом таллия и моноселинида индия.
DOI:
https://doi.org/10.31489/2023No4/23-32Ключевые слова:
монокристалл, кристаллическая структура, элементарная ячейка, пространственная группа, электронное облучение, флюенс, размер кристаллитов, шероховатостьАннотация
В данной работе исследовано влияние электронного облучения на структуру, морфологию поверхности и запрещенную зону моно- и поликристаллов легированных железом тройных кристаллов моноселинидов таллия и индия. Установлено, что синтезированные поликристаллические образцы, а также выращенные монокристаллы моноселинидов таллия и индия являются однофазными. Кристаллы имеют тетрагональную элементарную ячейку (пр. гр. I4/мкм) со следующими параметрами решетки: a ~ b = 8,12 Å, c = 6.88 Å, α=β=γ = 90°. Облучение электронами с энергией 2 МэВ и плотностью тока пучка 0,085 мкА/см2 приводит к изменениям структуры и свойств кристаллов сложным образом в зависимости от флюенса электронов. Также приводит к изменению параметров кристаллической решетки, увеличению максимального значения среднеарифметического отклонения профиля, а также уменьшению высоты средней шероховатости поверхности облученных кристаллов. Облучение порошкового образца электронами с плотностью энергии 5x1016 эл/см2 способствует увеличению размера нанокристаллитов с 32.50 нм до 43.33 нм.
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